3M™ CMP Pad Conditioner Brush

3M ID B5005035336
  • Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
  • Easy connection to polishing tool end effector
  • Exclusive polymer substrate enhances corrosion resistance
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Product Details
  • Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
  • Easy connection to polishing tool end effector
  • Exclusive polymer substrate enhances corrosion resistance

Engineered CMP pad conditioner brushes are designed for critical semiconductor buff CMP applications.