- Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
- Easy connection to polishing tool end effector
- Exclusive polymer substrate enhances corrosion resistance
Product Details
- Durable brush bristles assist with removal of pad debris from microreplicated, porometric and felt-based pads
- Easy connection to polishing tool end effector
- Exclusive polymer substrate enhances corrosion resistance
Engineered CMP pad conditioner brushes are designed for critical semiconductor buff CMP applications.
