The high boron content (almost 80 wt%) of 3M™ Boron Carbide makes this material a cost-effective boron source for the production of boron halides and metal borides.
Our manufacturing process for 3M™ Boron Carbide yields consistent high purity and a high boron content of almost 80 wt%, making this material a cost-effective boron source. 3M boron carbide is used as a boron source for the chemical formation of boron trichloride gas (BCl3) or boron tribromide liquid (BBr3), both used for doping of semiconductors. Boron carbide powder is also used as a raw material for a variety of high-purity, boron-related materials such as titanium diboride and zirconium diboride, and for the boronizing/boriding (hardening) of steel surfaces.
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