Diamond, soft-brush and microreplicated CMP pad conditioners from 3M, developed with your toughest semiconductor fabrication challenges in mind.
In the world of semiconductor fabrication, consistency, reliability and yield are critical at every part of the process. For over 25 years, 3M™ CMP Pad Conditioners have provided innovative pad conditioning solutions to some of the world’s leading semiconductor fabricators.
Explore solutions like the exclusive sintered abrasive diamond technology behind 3M™ Diamond Pad Conditioners or the precisely microreplicated patterns in 3M™ Trizact™ Pad Conditioners. Plus, metal-sensitive processes can benefit from 3M disks with metal-free cutting surfaces and 3M™ CMP Pad Conditioner Coatings for powerful additional protection from metal contamination.
Our global technical team is committed to continually redefining the cutting edge of CMP polishing pad conditioner technology. Research and manufacturing facilities around the world provide convenient product support and product supplies.
3M™ Trizact™ Pad Conditioners
3M™ Diamond Pad Conditioners
3M™ CMP Pad Conditioner Brushes
Our pad conditioners work with many common combinations of pad hardness and density. See what works best for you, or let our technical team test a custom specification.
Are you seeing reduced chip yields, metal residues on the IC surface or diamond loss after your CMP process? As advanced and mature nodes get more sensitive and slurries get harsher, metal leaching is increasingly becoming a challenge for semiconductor manufacturers.
Thin, clear 3M™ CMP Pad Conditioner Coatings fight back against metal leaching by trapping metal ions. 3M tests show coatings can help prevent up to 99% of metal from leaching out into the slurry or wafer while also helping reduce scratching issues. Coatings can be factory-applied to any 3M pad conditioner and help maintain a high level of process consistency and control even under challenging conditions.
Pair them with:
The T Series enhances the conventional 3M™ Trizact™ pad conditioner platform with a surface topography optimised for stronger pad activation, slower pad wear rate decay and even more consistent performance.
The C Series brings extra-precise diamond placement at the micrometer scale to further help control co-planarity and flatness for even more consistent performance in CMP pad conditioning.
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3M™ Diamond Pad Conditioner
3M Stock
B5005035338
3M™ Trizact™ Pad Conditioner T Series
3M Stock
B5005469002
3M™ CMP Pad Conditioner Brush
3M Stock
B5005035336
3M™ Diamond Pad Conditioner C Series
3M Stock
B5005469001
3M™ Trizact™ Pad Conditioner
3M Stock
B5005049057
